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Inventi Impact: VLSI

Articles

  • Inventi:evs/33455/20
    A Scalable and Low Stress Post-CMOS Processing Technique for Implantable Microsensors
    Research 2021 : January - March
    Ah-Hyoung Lee, Jihun Lee, Farah Laiwalla, Vincent Leung, Jiannan Huang, Arto Nurmikko, Yoon-Kyu Song

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    How to Cite this Article
    Attribution/ CC Compliant Citation: Lee, Ah-Hyoung, et al. \"A scalable and low stress post-CMOS processing technique for\nimplantable microsensors.\" Micromachines 11.10 (2020): 925.\nhttps://doi.org/10.3390/mi11100925\nhttp://creativecommons.org/licenses/by/4.0/\nSome formatting elements, header, footer, logos, dates and pagination were modified while adapting this article.
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